Name¡G

Fang-Hsing Wang

Position¡G Professor
Education¡G Ph.D. in Electronics Engineering, NCTU
Tel¡G +886-4-22840688 ext.706
E-mail¡G

fansen@dragon.nchu.edu.tw

Laboratory¡G

Display Tech. & Circuit Design Lab 722A

 
Experiences
Professor, Department of Electrical Engineering & Graduate Institute of Optoelectronics, National Chung Hsing University, Feb. 2017-present
Associate Professor, Department of Electrical Engineering & Graduate Institute of Optoelectronics, National Chung Hsing University, Aug. 2011 - Jan. 2017
Assistant Professor, Department of Electrical Engineering, National Chung Hsing University, Aug. 2003 - July 2011
Principal Engineer, Novatek Microelectronics Corp.,
Assistant Professor, Department of Electronics Engineering, Chienkuo Technology University,
Senior Engineer, AU Optronics Corp.,
 
Research Areas
VLSI Process Technology
Integrated Circuits Design
Flat Panel Display Technology
Si Thin-film Solar Cell/Transparent Conducting Oxide Film Technology
One-dimensional nanomaterial/photodetector/Gas sensor
 
Selected Publications
A.´Á¥Z½×¤å
 1. Ching-Tian Chou and Fang-Hsing Wang*, ¡§Fabrication and characterization of transparent conducting reduced graphene oxide/Ag nanowires/ZnO:Ga composite thin films on flexible substrates,¡¨ Journal of Vacuum Science and Technology A, vol.36, no.5, pp.05G504, September 2018. (SCI¡BEI)
 2. Chih-Cheng Chen, Fang-Hsing Wang,* Sheng-Cheng Chang, and Cheng-Fu Yang*, ¡§Using Oxygen Plasma Pretreatment to Enhance the Properties of F-Doped ZnO Films Prepared on Polyimide Substrates,¡¨ Materials, vol.11, no.9, pp.1501, August 2018. (SCI¡BEI)
 3. Fang-Hsing Wang*, Chih-En Tsai, ¡§ZnO Nanorod-Based Ultraviolet Photodetector Prepared on Patterned Sapphire Substrates,¡¨ IEEE Journal of Selected Topics in Quantum Electronics, vol.23, March 2017. (SCI¡BEI)
 4. Fang-Hsing Wang, Jen-Chi Chao, Han-Wen Liu, Feng-Jia Liu, ¡§Physical Properties of TiO2-doped Zinc Oxide Thin Films: Influence of Plasma Treatment in H2 and/or Ar Gas Ambient,¡¨ Vacuum, vol.N/A, January 2017. (SCI¡BEI)
 5. Fang-Hsing Wang and Kuo-Feng Chen, ¡§Efficiency Enhancement of Flexible Inorganic Powder Electroluminescent Devices Using the BaTiO3-MWNT Composite Dielectric Layer,¡¨ IEEE Journal of Display Technology, vol.12, no.11, November 2016. (SCI¡BEI)
 6. Fang-Hsing Wang, Kun-Neng Chen, Chao-Ming Hsu, Min-Chu Liu and Cheng-Fu Yang, ¡§Investigation of the Structural, Electrical, and Optical Properties of the Nano-Scale GZO Thin Films on Glass and Flexible Polyimide Substrates,¡¨ Nanomaterials, vol.2016, no.6, pp.88, May 2016. (SCI¡BEI)
 7. Fang-Hsing Wang,* Chiao-Lu Chang, ¡§Effect of substrate temperature on transparent conducting Al and F co-doped ZnO thin films prepared by rf magnetron sputtering,¡¨ Applied Scuface Science, vol.370, pp.83-91, February 2016. (SCI¡BEI)
 8. Ching-Tian Chou, Fang-Hsing Wang*, Wei-Chun Chen, ¡§Effects of concentration of reduced graphene oxide on properties of sol¡Vgel prepared Al-doped zinc oxide thin films,¡¨ Thin Solid Films, vol.605, pp.143-148, November 2015. (SCI¡BEI)
 9. Tsung-Kuei Kang*, Yun-Feng Chen, Cheng-Li Lin, Fang-Hsing Wang, Han-Wen Liu, Feng-Tso Chien, and Jen-Bin Shi, ¡§Improved Retention Characteristics of Pd-Nanocrystal-Based Nonvolatile Memories by a Simple Timing Technique,¡¨ ECS Solid State Letters, vol.4, no.12, pp.N20-N22, September 2015. (SCI¡BEI)
 10. J. D. Hwang*, F. H. Wang, C. Y. Kung, and M. C. Chan, ¡§Using the Surface Plasmon Resonance of Au Nanoparticles to Enhance Ultraviolet Response of ZnO Nanorods-Based Schottky-Barrier Photodetectors,¡¨ IEEE Trans. on Nanotechnology, vol.14, no.2, pp.318-321, March 2015. (SCI¡BEI)
 11. Fang-Hsing Wang*, Yen-Hsien Lee, Tsung-Kuei Kang, Han-Wen Liu, ¡§Influence of RF power on physical properties of ZnO:ZnF2 thin films by RF magnetron sputtering,¡¨ Superlattices and Microstructures, vol.83, pp.289-298, March 2015. (SCI¡BEI)
 12. Fang-Hsing Wang*, Jen-Chi Chao, Han-Wen Liu, and Tsung-Kuei Kang, ¡§Physical Properties of ZnO Thin Films Codoped with Titanium and Hydrogen Prepared by RF Magnetron Sputtering with Different Substrate Temperatures,¡¨ Journal of Nanomaterials, vol.2015, pp.936482, January 2015. (SCI¡BEI)
 13. Fang-Hsing Wang* and Tung-Hsin Yang, ¡§Effect of hydrogen doping on the properties of Al, F co-doped ZnO films for thin film silicon solar cells applications,¡¨ This Solid Films, vol.605, pp.64-72, January 2015. (SCI¡BEI)
 14. Fang-Hsing Wang*, Hung-Peng Chang, Jui-Yao Wu, Han-Wen Liu, ¡§Comparative Study on Physical Properties of ZnO:Al Thin Films by in situ Hydrogen Doping and Hydrogen Plasma Post-treatment,¡¨ Journal of Engineering (National Chung Hsing University), vol.25, no.3, pp.95-106, December 2014.
 15. 11Fang-Hsing Wang, Shang-Chao Hung, Cheng-Fu Yang*, and Yen-Hsien Lee, ¡§Effects of Hydrogen Plasma on the Electrical Properties of F-Doped ZnO Thin Films and p-i-n ??-Si:H Thin Film Solar Cells,¡¨ International Journal of Photoenergy,, vol.2014, pp.425057, May 2014. (SCI¡BEI)
 16. J. D. Hwang*, F. H. Wang, C. Y. Kung, M. J. Lai, and M. C. Chan, ¡§Annealing effects of Au nanoparticles on the surface-plasmon enhanced p-Si/n-ZnO nanorods heterojunction photodetectors,¡¨ Journal of Applied Physics, vol.115, pp.173110, May 2014. (SCI¡BEI)
 17. Fang-Hsing Wang, Cheng-Fu Yang, Jian-Chiun Liou, In-Ching Chen, ¡§Effects of Hydrogen on the Optical and Electrical Characteristics of the Sputter-Deposited Al2O3-doped ZnO Thin Films,¡¨ Journal of Nanomaterials, vol.2014, pp.857614, March 2014. (SCI¡BEI)
 18. Fang-Hsing Wang, Cheng-Fu Yang*, Jian-Chiun Liou, In-Ching Chen, ¡§Effects of Hydrogen on the Optical and Electrical Characteristics of the Sputter-Deposited Al2O3-doped ZnO Thin Films,¡¨ Journal of Nanomaterials, vol.2014, pp.857614, March 2014. (SCI¡BEI)
 19. Fang-Hsing Wang, Hsin-Hui Kuo, Cheng-Fu Yang and Min-Chu Liu, ¡§ Role of SiNx Barrier Layer on the Performances of Polyimide Ga2O3-doped ZnO p-i-n Hydrogenated Amorphous Silicon Thin Film Solar Cells,¡¨ Materials, vol.7, no.2, pp.948-962, February 2014. (SCI¡BEI)
 20. Fang-Hsing Wang, Cheng-Fu Yang, Yen-Hsien Lee, ¡§Deposition of F-doped ZnO Transparent Thin Films using ZnF2-dpoed ZnO Target under Different Sputtering Substrate Temperature,¡¨ Nanoscale Research Letters, vol.9, no.97, February 2014. (SCI¡BEI)
 21. Fang-Hsing Wang, Hua-Tz Tzeng and Chia-Cheng Huang, ¡§Effects of Deposition Temperature on the Properties of Ga-Doped ZnO Thin Films,¡¨ Journal of Science and Innovation, vol.4, no.1, pp.7-12, January 2014.
 22. Chia-Cheng Huang, Fang-Hsing Wang, Cheng-Fu Yang, ¡§Influences of Deposition Power of GZO Thin Films on the Properties of the Heterojunction Diode Based on a NiO/GZO Bi-layer Structure,¡¨ International Journal of Nanotechnology, vol.11, no.1-4, pp.287-297, January 2014. (SCI¡BEI)
 23. Fang-Hsing Wang, Cheng-Fu Yang, Min-Chu Liu, ¡§Using Flexible Polyimide as a Substrate to Deposit ZnO:Ga Thin Films and Fabricate p-i-n 𝛼-Si:H Thin-Film Solar Cells,¡¨ International Journal of Photoenergy, vol.2013, October 2013. (SCI¡BEI)
 24. C.G. Kuo, C.L. Li, C.C. Huang, F.H. Wang, C.F. Yang*, I.C. Chen, ¡§Effects of H2 Flow Rate and H2 Plasma Treatment on the Properties of AZO Films,¡¨ Advanced Materials Research, vol.813, pp.447-451, September 2013. (EI)
 25. Chia-Feng Lin, Ming-Shiou Lin, Chi-Chi Chen, Peng-Han Tsai, Fang-Hsing Wang, ¡§Characterization of the well-aligned ZnO nanorod structure on a pulsed laser deposited AlZnO seed layer,¡¨ Surface & Coatings Technology, vol.231, September 2013. (SCI¡BEI)
 26. Chia-Cheng Huang, Fang-Hsing Wang, Chia-Ching Wu, Hong-Hsin Huang and Cheng-Fu Yang, ¡§Developing High Transmittance Heterojunction Diodes based on NiO/TZO Bi-Layer Thin Films,¡¨ Nanoscale Research Letters, June 2013. (SCI¡BEI)
 27. Fang-Hsing Wang, Chia-Cheng Huang and Cheng-Fu Yang, ¡§Optical and Electrical Properties of the Different Magnetron Sputter Power deposited Ga2O3-ZnO Thin Films and Applications in p-i-n a-Si:H Thin-Film Solar Cells,¡¨ International Journal of Photoenergy, April 2013. (SCI¡BEI)
 28. Fang-Hsing Wang, Kuo-Feng Chen, Yu-Han Chien, Chin-Chia Chang, Meng-Ying Chuang, ¡§Enhanced Luminance for Inorganic Electroluminescent Devices with a Charged Electret Journal of Luminescence,¡¨ Journal of Luminescence, vol.141, pp.106-110, March 2013. (SCI¡BEI)
 29. C.C. Huang, F.H. Wang, Y.C. Chen, G.J. Chen, C.J. Huang, and C.F. Yang, ¡§Investigating the Properties of ZnO-Al2O3-Y2O3 Transparent Conductive Metal Oxide Thin Films Prepared by E-beam PVD,¡¨ Advanced Science Letters, February 2013. (SCI¡BEI)
 30. Fang-Hsing Wang, Chia-Cheng Huang, Cheng-Fu Yang, ¡§Effects of deposition temperature and hydrogen flow rate on the properties of Al-doped ZnO thin films and amorphous silicon thin-film solar cells,¡¨ Applied Physics A, January 2013. (SCI¡BEI)
 31. Fang-Hsing Wang, Ching-Tien Chou, Tsung-Kuei Kang, Chia-Cheng Huang, Han-Wen Liu, Chung-Yuan Kung, ¡§Structural, electrical, and optical properties of carbon nanotube- incorporated Al-doped zinc oxide thin films prepared by sol-gel method,¡¨ Journal of Ceramic Processing Research, vol.14, no.2, pp.149-152, January 2013. (SCI¡BEI)
 32. Fang-Hsing Wang, Chia-Cheng Huang, Chien-Chen Diao, Chia-Ching Wu, Cheng-Fu Yang, ¡§Effects of Deposition Temperature and Hydrogen Plasma on the Properties of the Radio-Frequency Magnetron Sputtering Deposition of ZnO-Al2O3 Films,¡¨ Lecture Notes in Electrical Engineering, vol.234, pp.783-791, January 2013. (EI)
 33. Fang-Hsing Wang, Ming-Yue Fu, Chean-Cheng Su, Cheng-Fu Yang, Hua-Tz Tzeng, Han-Wen Liu, and Chung-Yuan Kung, ¡§ Improve the Properties of p-i-n 𝛼-Si:H Thin-Film Solar Cells Using the Diluted Hydrochloric Acid-Etched GZO Thin Films,¡¨ Journal of Nanomaterials, vol.2013, January 2013. (SCI¡BEI)
 34. Chia-Feng Lin, Ming-Shiou Lin, Chi-Chi Chen, Peng-Han Tsai, Fang-Hsing Wang, ¡§Characterization of the well-aligned ZnO nanorod structure on a pulsed laser deposited AlZnO seed layer,¡¨ Surface & Coatings Technology, December 2012. (SCI¡BEI)
 35. Tsung-Kuei Kang, Ta-Chuan Liao, Han-Wen Liu, Fang-Hsing Wang, Wen-Fa Wu, ¡§Effects of different tunnel layers on retention characteristics for Pd-nanocrystal-based nonvolatile memory,¡¨ Microelectronic Engineering, vol.95, no.-, January 2012. (SCI¡BEI)
 36. Fang-Hsing Wang*, Hung-Peng Chang, Chih-Chung Tseng, Chia-Cheng Huang, ¡§Effects of H2 plasma treatment on properties of ZnO:Al thin films prepared by RF magnetron sputtering,¡¨ Surface & Coatings Technology, vol.205, pp.5269-5277, September 2011. (SCI¡BEI)
 37. 3. Tsung-Kuei Kang, Ta-Chuan Liao, Chia-Min Lin, Han-Wen Liu, Fang-Hsing Wang, and Huang-Chung Cheng, ¡§Gate-All-Around Poly-Si TFTs With Single-Crystal-Like Nanowire Channels,¡¨ IEEE Electron Device Letters, vol.32, no.9, September 2011. (SCI¡BEI)
 38. Fang-Hsing Wang*, Hung-Peng Chang, Chih-Chung Tseng, Chia-Cheng Huang, ¡§Effects of H2 plasma treatment on properties of ZnO:Al thin films prepared by RF magnetron sputtering,¡¨ Surface & Coatings Technology, vol.205, no.-, September 2011. (SCI¡BEI)
 39. Kuo-Feng Chen, Fang-Hsing Wang*, Yu-Han Chien, Chin-Chia Chang, and Meng-Ying Chuang, ¡§Enhanced Luminescence of IEL Device with Carbon Nanotube-dielectric Composite Layer,¡¨ IEEE Electron Device Letters, vol.32, no.5, May 2011. (SCI¡BEI)
 40. Kuo-Feng Chen, Fang-Hsing Wang*, Yu-Han Chien, Chin-Chia Chang, and Meng-Ying Chuang, ¡§Enhanced Luminescence of IEL Device with Carbon Nanotube-dielectric Composite Layer,¡¨ IEEE Electron Device Letters, vol.32, no.5, pp.662-664, May 2011. (SCI¡BEI)
 41. Hung-Peng Chang, Fang-Hsing Wang*, Jen-Chi Chao, Chia-Cheng Huang, and Han-Wen Liu, ¡§Effects of thickness and annealing on the properties of Ti doped ZnO films by radio frequency magnetron sputtering,¡¨ Current Applied Physics, vol.133, no.s1, pp.s185-s190, April 2011. (SCI¡BEI)
 42. Fang-Hsing Wang*, Hung-Peng Chang, Chih-Chung Tseng, Chia-Cheng Huang, and Han-Wen Liu, ¡§Influence of Hydrogen Plasma Treatment on Al-doped ZnO Thin Films for Amorphous Silicon Thin Film Solar Cells,¡¨ Current Applied Physics, vol.133, April 2011. (SCI¡BEI)
 43. F. H. Wang*, H. P. Chang, J. C. Chao, ¡§Improved Properties of Ti-doped ZnO Thin Films by Hydrogen Plasma Treatment,¡¨ Thin Solid Films, vol.519, no.-, pp.5178-5182, February 2011. (SCI¡BEI)
 44. H.W. Liu, S.M. Chiou, H.C. Huang, J.Gong, F.H. Wang, ¡§Superior Reliability of Gate-All-Around Polycrystalline Silicon Thin-Film Transistors with Vacuum Cavities next to Gate Oxide Edges,¡¨ Jpn. J. Appl. Phys., vol.50, no.1, January 2011. (SCI¡BEI)
 45. Tsung-Kuei Kang*, Han-Wen Liu, Fang-Hsing Wang, Cheng-Li Lin, Ta-Chuan Liao, Wen-Fa Wu, ¡§Improved characteristics for Pd nanocrystal memory with stacked HfAlO¡VSiO2 tunnel layer,¡¨ Solid-State Electronics, vol.61, no.1, January 2011. (SCI¡BEI)
 46. H.W. Liu, S.M. Chiou, H.C. Ho, F.H. Wang, ¡§Degradation of n-channel low temperature poly-Si TFTs dynamically stressed in OFF region with positive drain bias,¡¨ Microelectronic Engineering, vol.-, no.-, January 2011. (SCI¡BEI)
 47. Yen-Ting Chen, Fang-Hsing Wang*, ¡§Class-AB Rail-to-Rail CMOS Buffer Amplifier for TFT-LCD Source Drivers,¡¨ Journal of Engineering, National Chung Hsing University, vol.21, January 2010. (EI)
 48. H. P. Chang, Fang-Hsing Wang*, J. Y. Wu, C. Y. Kung and H. W. Liu, ¡§Enhanced Conductivity of Aluminum Doped ZnO Films by Hydrogen Plasma Treatment,¡¨ Thin Solid Films, vol.518, pp.7445-7449, January 2010. (SCI¡BEI)
 49. Fang-Hsing Wang, Tzu-Ching Lin, and Shien-Der Tzeng, ¡§Fabrication of Carbon nanotubes Field Emission Cathode by Composite Plating,¡¨ Journal of Nanoscience and Nanotechnology, vol.10, pp.4607-4611, January 2010. (SCI¡BEI)
 50. Fang-Hsing Wangƒx, Tzu-Ching Lin, Ching-Tien Chou and Shien-Der Tzeng, ¡§Field emission properties of carbon nanotube cathodes produced using composite plating,¡¨ Applied Surface Science, vol.256, pp.7600-7605, January 2010. (SCI¡BEI)
 51. Han-Wen Liu, Si-Ming Chiou, and Fang-Hsing Wang, ¡§Turn-Around Phenomenon in the Degradation Trend of n-Type Low-Temperature Polycrystalline Silicon Thin-Film Transistors under DC Bias Stress,¡¨ Jpn. J. Appl. Phys., vol.49, pp.074103, January 2010. (SCI¡BEI)
 52. Chia-Cheng Huang, Fang-Hsing Wang, Cheng-Fu Yang, Hong-Hsin Huang, Cheng-Yi Chen, Ping-Chih Huang, ¡§The Influence of Annealing Temperatures on the Properties of Dual-Layer W-TiO2 Thin Films,¡¨ Key Engineering Materials,, vol.434-435, pp.506-509, January 2010. (EI)
 53. Kuo Feng Chen, Fang-Hsing Wang, Lih Hsiung Chan, Shih Chieh Hsu, Yu Han Chien, Shih Hsien Liu, and Kung Lung Cheng, ¡§Multicolor polymer disperse microencapsulated liquid crystal displays,¡¨ IEEE Journal of Display Technology, vol.5, no.6, pp.184-187, June 2009. (SCI¡BEI)
 54. Fang-Hsing Wang, Chih-Ying Lin, Hung-Peng Chang, Han-Wen Liu, ¡§A Novel Complementary Mirror Type Analog Buffer for LTPS TFT-LCD Data Drivers,¡¨ Chinese Journal of Electron Devices, vol.31, no.1, pp.100-104, January 2008. (EI)
 55. Hong-Hsin Huang, Hung-Peng Chang, Fang-Hsing Wang, Yuan-Shing Liu, Moo-Chin Wang, and Ding-Fwu Lii, ¡§Characteristics and Optical Properties of Ni Nanograins Reduced on TiO2 Film,¡¨ Jpn. J. Appl. Phys., vol.47, no.1, January 2008. (SCI¡BEI)
 56. H. C. Cheng, C. Y. Huang, F. S. Wang, K. H. Lin, and F. G. Tarntair, ¡§Thin-Film Transistors with Polycrystalline Silicon Films Prepared by Two-Step Rapid Thermal Annealing,¡¨ Jpn. J. Appl. Phys., vol.39, no.1A/B, L19-L21, January 2000. (SCI¡BEI)
 57. F. S. Wang, C. Y. Huang and H. C. Cheng, ¡§Plasma passivation effects on polycrystalline silicon thin-film transistors utilizing nitrous oxide plasma,¡¨ Jpn. J. Appl. Phys., vol.36, no.4A. (SCI¡BEI)
 58. H. C. Cheng, F. S. Wang and C. Y. Huang, ¡§Effects of NH3 plasma passivation on n-channel polycrystalline silicon thin-film transistors,¡¨ IEEE Trans. Electron Devices., vol.44, no.1, pp.64-68. (SCI¡BEI)
 59. F. S. Wang, M. J. Tsai, W. K. Lai, and H. C. Cheng, ¡§Investigation of dosage effect on the activation of arsenic- and boron-implanted LPCVD amorphous-silicon films,¡¨ Appl. Surface Science, vol.92, pp.372-377, January 1996. (SCI¡BEI)
 60. F. S. Wang, M. J. Tsai, and H. C. Cheng, ¡§The effects of NH3 plasma passivation on polysilicon thin film transistors,¡¨ IEEE Electron Device Lett, vol.16, no.11, pp.503-505, January 1995. (SCI¡BEI)
B.¬ã°Q·|½×¤å
 1. F H Wang*, H S Jhuang, H W Liu and T K Kang, ¡§Radio frequency sputter deposition of Ga and F co-doped ZnO thin films: Effects of substrate temperature,¡¨ 4th Annual International Workshop on Materials Science and Engineering, Xi'an, China, May 2018.
 2. Fang-Hsing Wang, He-Syun Jhuang, and Han-Wen Liu, ¡§Post annealing temperature effect on properties of Ga and F codoped ZnO thin films prepared by RF magnetron sputtering,¡¨ THE TWENTY-FOURTH INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES, Kyoto, Japan, July 2017.
 3. Chun-Chi Lin, Fang-Hsing Wang*, and Mao Shan Chen, ¡§Effect of hydrogen doping on the properties of Al, F co-doped ZnO films for thin film silicon solar cells applications,¡¨ The 9th International Workshop on Zinc Oxide and Related Materials (IWZnO 2016), Sendai, Japan, October 2016.
 4. Fang-Hsing Wang* and Chih-En Tsai, ¡§Structural and Gas Sensing Characteristics of ZnO Nanorods Grown on Different Substrates,¡¨ 16th International Conference on Nanotechnology (IEEE NANO 2016), Sendai, Japan, August 2016.
 5. Fang-Hsing Wang*, Chiao-Lu Chang, ¡§Transparent conducting Al and F co-doped ZnO thin films prepared by rf magnetron sputtering,¡¨ The 13th International symposium on Sputtering & Plasma Processes (ISSP 2015), Kyoto, Japan, July 2015.
 6. Fang-Hsing Wang, Ching-Shan Wang and Jhih-Yuan Lin, ¡§Fabrication of ZnO Nanorod Arrays by Lift-off Technique on Sapphire Substrates,¡¨ Optics & Photonics Taiwan, International Conference (OPTIC 2014), Taichung, Taiwan, December 2014.
 7. Fang-Hsing Wang, Jing-Tian Jou, Wei-Chun Chen, ¡§Influences of concentration of reduce graphene oxide on properties of sol-gel prepared Al-doped Zinc oxide thin film,¡¨ The 7th International Conference on Technological Advances of Thin Films & Surface Coatings (ThinFilms2014), Chongqing, China, July 2014.
 8. Tung-Hsin Yang, Fang-Hsing Wang*, Chun-Chi Lin, Yen-Lin Chiu, ¡§Characterization of Al-F co-doped ZnO:H thin films by magnetron sputtering,¡¨ Optics & Photonics Taiwan, International Conference, OPTIC 2013, Chung-li, Taiwan, December 2013.
 9. Fang-Hsing Wang, Hua-Tz Tzeng, Chia-Cheng Huang, and Miao-Chi Shih, ¡§Effects of Thickness on the Properties of ZnO:Ga Thin Films by RF Magnetron Sputtering,¡¨ Optics & Photonics Taiwan, International Conference 2012 (OPTIC 2012), Taipei, Taiwan, December 2012.
 10. F. H. Wang*, C. J. Lai, P. S. Shih, and P. C. Lin, ¡§Cyclic Digital-to-Analog Converter with Double Conversion Rate and Capacitor Swapping Scheme,¡¨ International Display Manufacturing Conference (IDMC) 2011, Taipei, Taiwan, April 2011.
 11. F. H. Wang, H. P. Chang, H. W. Liu, ¡§Effects of Post-treatments on Characterization of Aluminum-doped zinc oxide thin films for amorphous crystalline silicon thin film solar cells,¡¨ The International Conference on Technological Advances of Thin Films & Surface Coatings 2011, Harbin, China, July 2010.
 12. F. H. Wang, H. C. Lin, P. S. Shih, L. Y. Lin, H. W. Liu, ¡§New Current Programmed Pixel Circuit for Active-Matrix Organic Light-Emitting-Diode Displays,¡¨ IDMC/3DSA/Asia Display Conference, Taipei, Taiwan, April 2009.
 13. Han-Wan Liu, Jie-Sung Lin, Zhi-Yuan Wang, Si-Ming Chiou and Fang-Hsing Wang, ¡§Turn-around Phenomenon of the Poly-Si Thin Film Transistor¡¦s Degradation under DC Bias Stress,¡¨ 2008 Int. Electron Devices and Material Symposia (IEDMS ¡¥08), Taichung, Taiwan, November 2008.
 14. Han-Wen Liu, Jiun-Yan Tsai, Wei Lai, Si-Ming Chiou and Fang-Hsing Wang, ¡§Instability of a-Si:H TFTs Under Asychronous AC Bias Stress,¡¨ 2008 Int. Electron Devices and Material Symposia (IEDMS ¡¥08), Taichung, Taiwan, November 2008.
 15. H. P. Chang, F. H. Wang, Y. C. Chen, J. Y. Wu, and H. W. Liu, ¡§Effects of RF sputtered Al-doped ZnO films by Hydrogen process gas dilution,¡¨ 2008 International Electron Devices and Material Symposia (IEDMS¡¦08), Taichung, Taiwan, November 2008.
 16. H. P. Chang, F. H. Wang, Y. C. Chen, J. Y. Wu, and H. W. Liu, ¡§Effects of RF sputtered Al-doped ZnO films by Hydrogen process gas dilution,¡¨ 2008 International Electron Devices and Material Symposia (IEDMS), Taichung, Taiwan, November 2008.
 17. F. H. Wang, Z. J. Lin, and S. D. Tzeng, ¡§Fabrication of Carbon Nanotube Field Emission Cathode by Composite Plating,¡¨ The 4th Int. Conf. on Technological Advances of Thin Films & Surface Coatings (ThinFilms2008), Singapore, July 2008.
 18. Hong-Hsin Huang, Hung-Peng Chang, Fang-Hsing Wang, Yuan-Shing Liu, Moo-Chin Wang, Ding-Fwu Lii, ¡§Characteristics and Optical Properties of Nano Ni Grains Reduced on TiO2 Film,¡¨ 2007 International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies (EM-Nano 2007), Nagano, Japan, June 2007.
 19. Fang-Hsing Wang and Chih-Ying Lin, ¡§A Novel Complementary Mirror Type Analog Buffer for LTPS TFT-LCD Data Drivers,¡¨ Asia Display 2007 International Conference, Shanghai, China, May 2007.
 20. Fang-Hsing Wang, Chih-Ying Lin, ¡§A Novel Complementary Mirror Type Analog Buffer for LTPS TFT-LCD Data Drivers,¡¨ Asia Display 2007 International Conference, Shanghai, China, May 2007.
 21. Fang-Hsing Wang and Yen-Ting Chen, ¡§Peripheral Circuit Design of Low Temperature Polycrystalline Silicon Thin-Film Transistor Flat Panel Display By Using Continuous-Wave Laser Crystallization,¡¨ OPT 2006, Hsinchu, NTHU, December 2006.
 22. T. H. Hsu and F. H. Wang, ¡§Low Offset Voltage and High Slew Rate Buffer Amplifier for TFT-LCD Applications,¡¨ 2006 Taiwan Display Conference, Taipei, June 2006.
 23. [8] Hong-Hsin Huang, Hung-Peng Chang, Moo-Chin Wang, I-Ming Hon, Fang-Hsing Wang, and Kuan-Zong Fung, ¡§Growth Characteristics of Nano-grained Sm-doped Ceria Film Prepared by E-beam Evaporation,¡¨ The 18th American Conference on Crystal Growth and Epitaxy, Stanford Sierra Camp, Lake Tahoe, CA, USA, June 2006.
 24. Fang-Hsing Wang and Tung-Hsuan Hsu, ¡§A High Slew Rate and Low Offset Voltage Buffer for TFT-LCD Source Driver,¡¨ Society of Information Display, SanFrancisco, CA, USA, 2006, June 2006. (SCI¡BEI)
 25. Fang-Hsing Wang, M. C. Wang, T. Y. Chang, H. P. Chang, and J. W. Tsai, ¡§Image Contrast Enhancement for TFT-LCDs,¡¨ 2006 Taiwan Display Conference, Taipei, June 2006.
 26. M. Q. Wang and F. H. Wang, ¡§A Novel Reference Voltage Adjustment Circuits for Liquid Crystal Displays,¡¨ 15th VLSI/CAD Symposium, Ken-Ting, Taiwan, Aug. 10-13, August 2004.
 27. F. S. Wang, C. Y. Huang, and H. C. Cheng, ¡§Plasma passivation effects on polycrystalline silicon thin-film transistors using NH3 and N2O,¡¨ International Electron Device and Material Symposium,(IEDMS 96¡¦), National Tsing Hua University, Hsinchu, Taiwan, R.O.C., Dec. 16-20, 1996, December 1996.
 28. F. S. Wang, C. Y. Huang, and H. C. Cheng, ¡§Novel N2O plasma passivation on polycrystalline silicon thin-film transistors,¡¨ Material Research Society (MRS 96¡¦), San Francisco, California, U.S.A., Apr. 7-12, 1996, April 1996. (EI)